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发明名称
Elektrostatische Haltevorrichtung benutzbar in Hochdichteplasma
摘要
申请公布号
DE69325633(T2)
申请公布日期
1999.12.02
申请号
DE19936025633T
申请日期
1993.12.01
申请人
APPLIED MATERIALS, INC.
发明人
COLLINS, KENNETH S.;TROW, JOHN R.;TSUI, JOSHUA CHIU-WING;RODERICK, CRAIG A.;BRIGHT, NICOLAS J.;MARKS, JEFFREY;ISHIKAWA, TETSUYA;DING, JIAN
分类号
H01L21/302;H01L21/3065;H01L21/683;(IPC1-7):C23C14/50;H01L21/00;B23K26/00;C23C16/44
主分类号
H01L21/302
代理机构
代理人
主权项
地址
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