| 摘要 |
Charged-particle beam lithography apparatus are disclosed that form a demagnified image of a sub-field of a reticle on a sensitized substrate. The charged-particle beam is shaped by a field stop and the field stop is demagnified onto the reticle. A blanking deflector is provided that deflects the charged-particle beam. If the charged-particle beam is sufficiently deflected by the blanking deflector, a blanking aperture blocks the charged-particle-beam while maintaining uniform irradiation of the field stop. After transmission by the reticle, projection lenses project the charged-particle beam onto a sensitized substrate. The charged-particle beam is converging at the field stop so that scattering of the beam and heating of the field stop are reduced.
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