| 摘要 |
PROBLEM TO BE SOLVED: To provide a fault wiring detecting circuit having high detecting precision of imperfection, a semiconductor wafer for detecting fault wiring and a fault wiring detecting method using them. SOLUTION: A fault wiring detecting circuit is formed on the surface of a semiconductor wafer for detecting fault wiring. The fault wiring detecting circuit is constituted of a wiring 16, whose capacitance with a semiconductor substrate is large and a wiring 18 the capacitance of which with the semiconductor substrate is small. Electron beam scanning is performed crossing the wirings 16, 18, the quantity of secondary electrons generated from the wirings is measured. Since the quantity of secondary electrons decreases in a short-circuiting part of both of the wirings, it can be detected. |
