发明名称 APPARATUS FOR REGENERATING ETCHING SOLUTION
摘要 FIELD: systems for regenerating etching solution. SUBSTANCE: apparatus includes tank in the form of cylinder or polyhedron inscribed in cylinder and cover. Two or more electrodes made of water permeable material are arranged in tank coaxially one relative to another and to tank. Electrodes form communicated cavities in tank. Branch pipe for ejecting solution is arranged in central portion of cover coaxially with tank. Additional gas discharging tube arranged in cover and branch pipe for ejecting solution are connected with cavity restricted by outer electrode and tank wall. Gas discharge tube allows to extract out of solution ions of metals that are more electrically negative relative to copper. EFFECT: enlarged manufacturing possibilities of apparatus. 2 dwg
申请公布号 RU2142024(C1) 申请公布日期 1999.11.27
申请号 RU19980116032 申请日期 1998.07.29
申请人 SLEDOVATEL'SKIJ TEKHNOLOGICHESKIJ INSTITUT 发明人 NOVIKOV D.B.;RESHETNIKOV A.M.
分类号 C23F1/46;C23G1/36 主分类号 C23F1/46
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