| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable photographic sensitive material which lowers surface resistance (surface electric resistanceΩ) after heat development and which has good adhesion performance to a film. SOLUTION: This material contains org. silver salts, photosensitive silver halide particles and a reducing agent on a supporting body, and further it has a protective layer containing (1) electrically conductive metal oxides and oil, (2) electrically conductive metal oxides and polymer latex or (3) electrically conductive metal oxides and compds. expressed by the formula. In the formula, R1 to R8 are independently hydrogen atoms, halogen atoms, alkyl groups, alkoxy groups, hydroxy groups or satd. aliphatic monocarboxylic acid groups. Preferably the polymer latex has -30 to 90 deg.C Tg (glass transition temp).
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