发明名称 Semiconductor element used as MOSFET or bipolar transistor
摘要 In the drift region (4) of a semiconductor element (1), there is an additional doping with material whose conductivity complements the conductivity of the doping of the drift region, where the energy level of the additional dopant material settles in the region of the Fermi energy of the drift region (4). Semiconductor element comprises a body (1) with a first doped cathode zone (2) and a second doped anode zone (3). A doped drift region (4) is formed in the cathode zone (2) and the anode zone (3). In the drift region (4) there is an additional doping with material whose conductivity complements the conductivity of the doping of the drift region, where the energy level of the additional dopant material settles in the region of the Fermi energy of the drift region (4).
申请公布号 DE19846212(C1) 申请公布日期 1999.11.25
申请号 DE19981046212 申请日期 1998.10.07
申请人 SIEMENS AG 发明人 PFIRSCH, FRANK
分类号 H01L29/06;H01L29/167;H01L29/47;H01L29/78;H01L29/872;(IPC1-7):H01L29/78;H01L29/68 主分类号 H01L29/06
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