发明名称 FORMATION OF PHOTOCATALYST FILM ON ORGANIC SUBSTRATE AND ITS USE
摘要 <p>PROBLEM TO BE SOLVED: To form a photocatalyst film having excellent transparency and photocatalytic activity on the surface of an organic substrate with high adhesion strength without causing substrate deterioration (choking) by the photocatalyst film. SOLUTION: A siliceous under layer is formed on an organic substrate by applying an under coating material containing a product of hydrolysis of an alkoxysilane (wherein the alkoxysilane is oligomer and/or contains fluorine type surfactant having a perfluoroalkyl group) dissolved in an organic solvent and then a photocatalytic film is formed on the under layer by applying a photocatalytic coating material containing ultrafine titanium oxide with 0.1μm or smaller average particle diameter, aβ-diketone, a titanate type or aluminum type coupling agent, and a product of hydrolysis of an alkoxysilane in an organic solvent.</p>
申请公布号 JPH11319709(A) 申请公布日期 1999.11.24
申请号 JP19980133747 申请日期 1998.05.15
申请人 MITSUBISHI MATERIALS CORP 发明人 YAMASHITA YUKIYA;HIRATA HIROKI;KAWAMURA KYOKO
分类号 B05D7/24;B01J35/02;B01J37/02;B32B9/00;C09D5/00;(IPC1-7):B05D7/24 主分类号 B05D7/24
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