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经营范围
发明名称
Method for fabricating photomasks having a phase shift layer
摘要
申请公布号
EP0907105(A3)
申请公布日期
1999.11.24
申请号
EP19980120629
申请日期
1993.07.30
申请人
DAI NIPPON PRINTING CO., LTD.
发明人
FUJITA, HIROSHI;KURIHARA, MASAAKI
分类号
H01L21/027;G03F1/00;(IPC1-7):G03F1/00
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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