发明名称 |
Gradient multilayer film generation process control |
摘要 |
Process control for generating graded multilayer films repetitively and consistently using both pulsed laser sputtering and magnetron sputtering deposition techniques. The invention includes an apparatus which allows for set up of an ultrahigh vacuum in a vacuum chamber automatically, and then execution of a computer algorithm or "recipe" to generate desired films. Software operates and controls the apparatus and executes commands which control digital and analog signals which control instruments.
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申请公布号 |
US5989397(A) |
申请公布日期 |
1999.11.23 |
申请号 |
US19970961528 |
申请日期 |
1997.10.30 |
申请人 |
THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE |
发明人 |
LAUBE, SAMUEL J. P.;VOEVODIN, ANDREY A.;ZABINSKI, JEFFREY S.;LECLAIR, STEVEN R. |
分类号 |
C23C14/02;C23C14/06;C23C14/22;C23C14/28;C23C14/35;C23C14/54;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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