| 摘要 |
A process for preparing a purified solution of blocked polyhydroxystyrene resin in reaction/photoresist solvent, comprising the steps of: (1) forming an impure reaction solution comprising blocked polyhydroxystyrene resin and acidic catalyst in reaction/potoresist solvent; (2) adding amine, at least one hydrophilic solvent, at least one hydrophobic solvent and water to said impure reaction solution, thereby forming an aqueous phase comprising water, the hydrophilic solvent, and at least one salt of the amine and the acidic catalyst and an organic phase comprising the hydrophilic solvent, the hydrophobic solvent, the reaction/photoresist solvent and the blocked polyhydroxystyrene resin; (3) separating the aqueous phase from the organic phase; and (4) removing the hydrophilic solvent and the hydrophobic solvent from the organic phase, thereby forming a purified solution of blocked polyhydroxystyrene resin in reaction/photoresist solvent.
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