| 摘要 |
PURPOSE:To easily form a pattern in a finely divided resin, by developing a photosensitive resin consisting of polyvinylalcohol and a tetrazonium salt (or a diazonium salt) after exposure using oxygen plasma. CONSTITUTION:A photosensitive resin is formed by mixing a tetrazonium salt such as o-dianisidine-tetrazonium chloride represented by formula I or a diazonium salt such as o-dimethoxydiazonium sulfate represented by formula II with polyvinylalcohol saponified to about 80 % in an amount of about 2-5 wt.% based on the total wt. of photosensitive resin. The photosensitive resin film thus prepared is exposed to light and then developed by selectively converting the unexposed parts into ash using oxygen plasma excited with a power of about 100 watts in a vacuum of 3 Torrs, for example, in a plasma machine with a tunnel. |
