IMPROVED INTERCONNECTION LAYER IN A SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE HAVING MACRO CELL REGIONS AND METHOD OF FORMING THE SAME

摘要

An interconnection layer extends across at least a macro cell region and at least a circuit region other than the macro cell region, the macro cell region and the circuit region being monolithically integrated into a semiconductor device, wherein the interconnection layer in the macro cell region is thinner than the interconnection layer in the circuit region.