| 发明名称 |
IR- and UV-radiation-sensitive composition and lithographic plate. |
| 摘要 |
An IR- and UV-radiation-sensitive composition comprising a diazo resin, a diazo ester, at least one novolac resin and an IR-ray absorber. A lithographic plate comprising a support coated with the said photosensitive composition. |
| 申请公布号 |
ZA9903248(B) |
申请公布日期 |
1999.11.11 |
| 申请号 |
ZA19990003248 |
申请日期 |
1999.05.11 |
| 申请人 |
LASTRA S.P.A. |
发明人 |
ANGELO BOLLI;PAOLO PEVERI;ANDREA TETTAMANTI |
| 分类号 |
G03F7/039;B41C1/10;B41M5/36;G03F7/00;G03F7/004;G03F7/022;G03F7/023 |
主分类号 |
G03F7/039 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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