| 摘要 |
A system is provided for control of ion concentration (as for example in pH or redox control), for use for example in etching articles, wherein other features such as specific gravity control are also provided. The ion concentration control is provided with cleaning and recalibration features. In a specific embodiment, provision is made for adding ammonia to an etching solution and for continuously monitoring the pH of the system. Visual indicators are provided for operator observation of fluid flow through various lines, generally by windows being provided in the cabinet apparatus. A particular electrode cell is disclosed as a prominent feature of ion concentration control.
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