发明名称 Vacuum deposition system and method.
摘要 <p>A large scale vacuum deposition facility 10 is disclosed in which substrates, in the form of architectural glass lights 12 on supporting racks 14, are moved through an evacuated working chamber system 16 where the substrates are coated by cathodic sputtering. The substrate racks 14 are moved by a conveyor system 18 through the working chamber system via an access chamber system 20, comprising an entrance chamber (30) and an isolation chamber (72) and enabling substantially continuous production of coated substrates without requiring the working chamber system be opened to atmosphere.</p><p>Operation of the working chamber system, the access chamber system, the conveyor system and associated components is monitored and governed from a process control console.</p>
申请公布号 EP0018690(A1) 申请公布日期 1980.11.12
申请号 EP19800200388 申请日期 1980.04.28
申请人 ADVANCED COATING TECHNOLOGY, INC. 发明人 LOVE, ROBERT BRUCE
分类号 C23C14/34;C23C14/56;(IPC1-7):23C15/00 主分类号 C23C14/34
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