| 摘要 |
Annealing a planar wave guide layer is critical because small structural imperfections lead to optical problems. Chemical vapor deposition of the layer tends to leave gaseous substances bonded to the deposit, which on being driven off by initial annealing warm-ups leave cavities requiring densification. Traditional annealing methods take several hours. This invention proposes a rapid heating of the layer to a temperature below the flow temperature, maintaining this temperature for about 30 to 300 seconds, then rapidly heating up further to a temperature close to or above the flow temperature, maintaining this temperature for about 30 to 300 seconds, then allowing the substrate and layer to cool rapidly to room temperature.
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