| 摘要 |
PROBLEM TO BE SOLVED: To obtain a resist compsn. which has a high sensitivity, high resolution, etc., and is capable of forming fine patterns by constituting the compsn. contg. a photo-acid-generator which acts in such a manner that a compd. having an allyl alcohol structure is decomposed by absorbing radiation for image information and turns to be a protective group for an alkali soluble group, etc. SOLUTION: A polymer which has the alkali soluble group and is soluble in a film formable basic aq. soln. is used. In addition, the compsn. contains the compd. having the allyl alcohol structure and the photo-acid-generator capable of generating an acid that the compd. having the allyl alcohol structure can protect the alkali soluble compd. when decomposed by absorbing the radiation for image formation. The exposed parts of this negative resist compsn. after the exposure are developable by the basic aq. soln. which is insoluble in the alkali. Namely, the polymer soluble in the film formable basic aq. soln. having the alkali soluble group is used as the polymer to be used as a base material resin and the compd. having the allyl alcohol structure is used. |
