发明名称 MIRROR FOR UV RAY
摘要 PROBLEM TO BE SOLVED: To provide a mirror for UV rays having high reflectance for light emitted in a UV region with a wide incident angle range (having good characteristics of incident angle) and small changes in the reflectance for polarized light with changes in the incident angle of rays (small separation in components of polarized light). SOLUTION: This mirror consists of at least a substrate 1, an aluminum(Al) film 2 formed on the substrate, and a dielectric multilayered film comprising alternately deposited low refractive index layers 3 and high refractive index layers 4 on the aluminum(Al) film. The dielectric multilayered film has the structure of L1 /[H/L2 ]<x> , wherein L1 and L2 represent low refractive index layers and H represents the high refractive index layer. The optical thickness of the layers satisfies the relation of 2L1≈L2≈H=0.25 to 0.35λor 2L1 =L2 =H=0.25 to 0.35λ, whereinλis the designed standard wavelength.
申请公布号 JPH11311704(A) 申请公布日期 1999.11.09
申请号 JP19980352801 申请日期 1998.12.11
申请人 NIKON CORP 发明人 SHIRAI TAKESHI
分类号 G02B5/08;H01S3/08;(IPC1-7):G02B5/08 主分类号 G02B5/08
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