发明名称 |
EXHAUST GAS TREATMENT APPARATUS |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide an apparatus for treating combustion exhaust gas discharged from a combustion type detoxifying apparatus for treating harmful gas discharged from a semiconductor manufacturing process by using a compact equipment. SOLUTION: A vertical exhaust gas inflow passage 6 and an exhaust gas outflow passage 7 are formed within a casing 1 so as to be demarcated and allowed to communicate by a communication port 9 and an impeller 2 is arranged in opposed relation to the communication port 9 so as to be rotatable around a horizontal axis. A washing water jet nozzle 16 ejecting washing water toward an inflow port 11 of the exhaust gas inflow passage 6 is arranged and a washing water jet nozzle 17 ejecting washing water to the communication port 9 part is arranged. An eliminator 15 is arranged in the exhaust gas outflow passage 7 on the downstream side of the impeller 2. A washing water jet nozzle 18 is arranged to be turned toward the eliminator 15 on the downstream side of the eliminator 15. A drain tank 4 receiving washing water after ejected is arranged within the casing 1 on the underside of the exhaust gas inflow passage 6 and the exhaust gas outflow passage 7.</p> |
申请公布号 |
JPH11309337(A) |
申请公布日期 |
1999.11.09 |
申请号 |
JP19980121559 |
申请日期 |
1998.05.01 |
申请人 |
IWATANI INTERNATL CORP |
发明人 |
MICHIBAYASHI FUMINORI;SHIGEMORI ATSUSHI |
分类号 |
B01D53/68;(IPC1-7):B01D53/68 |
主分类号 |
B01D53/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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