| 摘要 |
PROBLEM TO BE SOLVED: To securely suppress arc discharge generated in the process of glow discharge treating in the initial stage thereof while glow discharge treatment to the object to be treated is practiced and to prevent the thermal deformation of the object to be treated by attaining the uniformization of the temp. in the vessel. SOLUTION: In a glow discharge treating device 1 in which glow discharge is generated in a treating vessel 8 by discharge voltage generated in a main circuit 2, and glow discharge treatment is executed to the object 25 to be treated in the treating vessel 8, the inside of the treating vessel 8 is oppositely provided with a primary divided anode 9 and a secondary divided anode 10, the primary pluse side output line L1 of the main circuit 2 is connected to the primary divided anode 9 with a primary switch 22 interposed, the secondary plus-side output line L2 is connected to the secondary divided anode 10 via a secondary switch 23 interposed, and since the primary and secondary devided anodes 9 and 10 to be fed to glow discharge treatment are changed per half cycle of an inverter circuit 5 in succession, the state of the glow discharge changes per minute prescribed time of the half cycle, by which, while the flow discharge treatment is continued, its shift to arc discharge can securely be suppressed. At this time, by the change of the glow discharge state, the inside temp. of the treating vessel 8 can approximately be uniformized. |
