| 摘要 |
PURPOSE:To obtain a required thin film without contaminating an expensive entrance window by providing an inactive gas supplying means to an airtight container having a reaction gas supplying means and an air exhausting means, and blowing the inactive gas from the inactive gas supplying means along the face of an energy beam entrance window provided in the airtight container. CONSTITUTION:A substrate holder 6 housing an auxiliary heater therein is provided in an airtight container 1 having a reaction gas supplying means 7, an exhaust means 8 and a quartz-made entrance window 4 provided with an O-ring 4 on the upper open surface. A substrate 5 on which a thin film is to be grown is disposed on the holder 6. The substrate 5 is then heated to 200-300 deg.C while an incident light 3 from a light source such as a mercury lamp or laser is supplied through the entrance window 4 and a mixed gas of SiH4, NH3, N2O etc. is injected from the supplying tube 7 so as to produce a thin film on the surface of the substrate 5. In this construction, the ends of a tube 9 for supplying in active gas such as N2 which is shunted by means of a valve 10 are positioned near the periphery of the window for blowing N2 gas to the rear face of the window so that it can be kept clean. |
