| 摘要 |
PROBLEM TO BE SOLVED: To obtain good display characteristics and a wide visual field angle by disposing projection patterns subjected to microprocessing on pixels and forming part of the material constituting these patterns of polyimide. SOLUTION: A polyamic acid solution is selected as a projecting pattern forming material and is applied on a transparent conductive film of a color filter substrate. After the coating has been prebaked, the coating is subjected to photolithography, and curing imidization by using a positive resist, by which the color filters having the projecting pattern is obtained. The polyamic acid for yielding the polyimide having the glass transition temperature of the cured body within a range of 120 to 250 deg.C, preferably 150 to 230 deg.C is preferably can be need as a material affording the projecting patterns. The sectional shape of the projections is preferably a trapezoidal, semicircular or triangular shape. The pixel-like patterns are not particularly limited, insofar as the patterns divided the pixels to 2 or more divisions together with the projecting patterns of a oppositely facing substrate. |
