发明名称 RESIST COATING APPARATUS
摘要 PURPOSE:To obtain a highly accurate film thickness, by applying feedback control to the number of rotations and rotation time of a turntable on the basis of the detection result of atomizing concn. CONSTITUTION:The detection signal of a detection part 13 detecting atomizing concn. quantity is supplied to a rotation control part 11 to control the number of rotations and rotation time of a spin motor 3. In this case, the detection part 13 is equipped with a detector comprising a humidity sensor and, because an AC resistance value changes by the change of relative humidity, the atomizing concn. of a resist is detected by utilizing this characteristic change. When the atomizing concn. is high, the number of rotations or rotation time of a turntable 2 is reduced and, contrarily, when low, the number of rotations or rotation time of the turntable is increased to enable the coating of the resist reduced in the irregularity of a film thickness.
申请公布号 JPS6268570(A) 申请公布日期 1987.03.28
申请号 JP19850208519 申请日期 1985.09.19
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 ANDO HIROYUKI;TAKAHASHI MASANORI
分类号 G11B7/26;B05C11/08;G03F7/16;H01L21/027 主分类号 G11B7/26
代理机构 代理人
主权项
地址