发明名称 |
Apparatus for projecting electromagnetic radiation with a tailored intensity distribution |
摘要 |
Apparatus is disclosed that efficiently projects electromagnetic radiation over a predetermined spherical sector with a tailored intensity distribution. The apparatus includes a base having a cavity and aperture that faces the spherical sector to be illuminated, with a flat, ring-shaped shoulder surrounding the aperture. The apparatus further includes a mask spaced over the aperture and a baffle projecting from the mask toward the aperture. The base, the mask, and the baffle are formed of a material having an outer surface with a significant diffuse, reflective characteristic. A source emits electromagnetic radiation (e.g., visible light) into the base cavity, and the base, mask and baffle are configured to redirect this radiation outwardly with the tailored intensity distribution (e.g., a uniform distribution) over the predetermined spherical sector (e.g., a hemisphere, or 2 pi steradians).
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申请公布号 |
US5967652(A) |
申请公布日期 |
1999.10.19 |
申请号 |
US19980050175 |
申请日期 |
1998.03.30 |
申请人 |
ADVANCED OPTICAL TECHNOLOGIES, LLC |
发明人 |
RAMER, DAVID P.;WATSON, HAROLD E.;RITTER, MICHAEL P.;EPLING, BOBBY L.;SCHMITT, MARK G.;RAINS, JR., JACK C. |
分类号 |
G01S1/70;G01S5/16;G01S7/481;G01S17/42;G01S17/66;(IPC1-7):F21V7/14 |
主分类号 |
G01S1/70 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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