发明名称 |
Charged particle source |
摘要 |
A charged particle source applicable for etching, thin film deposition, or surface modification includes a conductive electrode for controlling the plasma potential and beam voltage, the electrode retaining long term conductivity during operation, such as by shielding or in situ cleaning during operation, and/or by being operated in pulse mode conditions capable of preventing charge accumulation in the source during ion extraction.
|
申请公布号 |
US5969470(A) |
申请公布日期 |
1999.10.19 |
申请号 |
US19960745950 |
申请日期 |
1996.11.08 |
申请人 |
VEECO INSTRUMENTS, INC. |
发明人 |
DRUZ, BORIS L.;HAYES, ALAN V.;KANAROV, VICTOR;DISTEFANO, SALVATORE A.;LAKIOS, EMMANUEL N. |
分类号 |
H01J27/16;H01J37/08;(IPC1-7):H01J27/16 |
主分类号 |
H01J27/16 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|