| 摘要 |
PROBLEM TO BE SOLVED: To improve a step difference elimination degree and a polishing speed by composing a polishing pad of a polymer material containing one or both of microcupsules or microbaloons. SOLUTION: This pad 4 comprises a basic material composed of a hard polymer material 2 and a plurality of hollow microcupsules or microbaloons 1 dispersed in the material 2 evenly. The microcapsules or microbaloons 1 burried in the material 2 are exposed onto a surface of the pad 4 when the surface thereof is dressed by diamond grains or the like, and they are partially cut out. Then, since they 1 are hollow, hollow spaces therein are exposed as part of the porous surface 9 onto the surface of the pad 4. Polishing agent is retained in these pores and transfered into adjacent ones successively. |
