发明名称 Method and apparatus employing external light source for endpoint detection
摘要 A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist material, from a substrate surface. A beam of light is projected onto the substrate surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a control mechanism which determines the proper disposition of the substrate. The control mechanism controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber.
申请公布号 US5969805(A) 申请公布日期 1999.10.19
申请号 US19970963508 申请日期 1997.11.04
申请人 MICRON TECHNOLOGY, INC. 发明人 JOHNSON, DAVID R.;PHILLIPS, JOE LEE;NIELSEN, TODD C.;HATFIELD, ROBERT J.
分类号 G01N21/27;G01N21/55;G01N21/64;G01N21/88;G01N21/956;H01J37/32;H01L21/00;H01L21/027;H01L21/302;H01L21/3065;H01L21/66;(IPC1-7):G01B11/00;G01B11/06 主分类号 G01N21/27
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