| 摘要 |
<p>A main controller (50) determines an exposure control desired value according to the transmittance of an optical system (28A, 28B, 32, PL) measured by means of a sensor (59) before the exposure or estimated by predetermined calculation and controls the exposure according to the determined exposure control desired value while a reticle pattern is being transferred onto a wafer (W) through the optical system. Since the exposure energy given to the image surface in a unit time over unit area changes with the transmittance of the optical system, the exposure control desired value is determined according to the transmittance of the optical system, and the exposure is controlled according to the determined control desired value. Therefore, high-precision exposure is achieved without being influenced by the variation of the transmittance.</p> |
