| 摘要 |
<p>A poly-Si TFT array substrate which is produced by a method in which a large-area high-quality polysilicon layer is formed in a low temperature process without laser annealing. The substrate leads to little display unevenness even if the screen is large and to high definition. The method for producing such a TFT array substrate for liquid crystal display comprising a process of fabricating poly-Si TFTs formed of a polysilicon semiconductor layer in channel regions, further comprises forming the polysilicon layer by allowing silicon particles excited by giving energy to them in advance to strike the substrate and depositing silicon particles on the substrate.</p> |
