| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of covering a conductive layer on a transferring work. SOLUTION: It comprises steps of forming a first electric-insulative mask pattern 2 on the surface of a conductive substrate 1, forming a second electric- insulative mask pattern 8 on the first mask pattern 2, forming a base conductive layer 9 higher than the height of the first mask pattern 2 on an unmasked part 3 of the substrate 1 by the electrodeposition, forming a conductive layer 4 on the base conductive layer 9 by the electrodeposition, removing the second mask pattern 8 on the substrate 2 after forming the conductive layer, forming a barrier conductive layer 7 on the conductive layer 1 after moving the second mask pattern, and forming an adhesive layer 15 on the barrier conductive layer 7. |
