发明名称 SUBSTRATE THERMAL PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce a maximum supply electric power amount at an electric power supply part, which supplies an electric power to a substrate thermal processing device. SOLUTION: A heating process part 1 for heating a substrate W and a cooling process part 2 for cooling the substrate W are provided, and the heating process part 1 and the cooling process part 2 are supplied with an electric power for temperature control. The heating process part 1 and the cooling process part 2 used for alternately heating process and cooling process, are supplied with the electric power for temperature control from a common electric poser supply part 3, and a substrate transfer device 5 transfers the heating process part 1 and the cooling process part 2 to the substrate W, so that the substrate W is thermally processed by only either the heating process part 1 or the cooling process part 2 to which the electric power is supplied from the electric power supply part 3.
申请公布号 JPH11274026(A) 申请公布日期 1999.10.08
申请号 JP19980070104 申请日期 1998.03.19
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 HISAI AKIHIRO
分类号 H01L21/027;G03F7/38;(IPC1-7):H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址