| 摘要 |
PROBLEM TO BE SOLVED: To increase yield in a photolithographic process and thereby increase the throughput in the manufacture of a device, by measuring exposure time for each photosensitive substrate, and when the exposure time exceeds a limiting value, dividing whether or not the exposure of a next photosensitive substrate should be conducted. SOLUTION: Upon the arrival of a wafer W at the head of a lot for main exposure on a wafer carriage line 2, a main control system 18 starts a timer to allow it to measure the exposure time for the wafer. When the measured exposure time exceeds a limiting value of exposure time for the wafer stored in a storage device 18a, the main control system 18 outputs information, including the measured wafer exposure time and a signal for showing that the measured exposure time exceeds the limit value, to a host computer 1. Then, on the host computer 1 side, the operator is notified of the information and determines, according to the instruction of the operator, where or not a next wafer should conduct the exposure processing. |
