PROJECTION EXPOSURE METHOD AND SYSTEM

摘要

A projection exposure method capable of keeping a liquid (7) filled between a projection optical system (PL) and a wafer (W) even while the wafer (W) is being moved when a liquid immersion method is used to conduct an exposure, wherein a discharge nozzle (21a) and inflow nozzles (23a, 23b) are disposed so as to hold a lens (4) at the tip end of the projection optical system (PL) in an X direction. When the wafer (W) is moved in a -X direction by an XY stage (10), a liquid (7) controlled to a preset temperature is supplied from a liquid supply device (5) via a supply pipe (21) and the discharge nozzle (21a) so as to fill the portion between the lens (4) and the surface of the wafer (W) and the liquid (7) is recovered from the surface of the wafer (W) by a liquid supply device (6) via a recovery pipe (23) and the inflow nozzles (23a, 23b), the supply amount and recovery amount of the liquid (7) being regulated according to a moving speed of the wafer (W).