发明名称 |
Method for forming cornered images on a substrate and photomask formed thereby |
摘要 |
A method for forming square shape images in a lithographic process is disclosed wherein a first plurality of lines running in a first direction is defined in a first, usually sacrificial, layer, and then a second resist is defined wherein the lines run in an intersecting pattern to those of the first layer, thereby creating cornered images wherever the first and second layer intersect and in the open areas between the lines. Methods are proposed for developing the square intersecting areas and the square angle areas defined by the openings. Additionally, a photomask is disclosed in which the length and width of the cornered images are independently patterned using the two-exposure process.
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申请公布号 |
US5959325(A) |
申请公布日期 |
1999.09.28 |
申请号 |
US19970917009 |
申请日期 |
1997.08.21 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ADAIR, WILLIAM J.;FERGUSON, RICHARD A.;HAKEY, MARK C.;HOLMES, STEVEN J.;HORAK, DAVID V.;LEIDY, ROBERT K.;MA, WILLIAM HSIOH-LIEN;MARTINO, RONALD M.;PENG, SONG |
分类号 |
H01L21/033;H01L21/8242;(IPC1-7):H01L27/108 |
主分类号 |
H01L21/033 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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