| 摘要 |
PROBLEM TO BE SOLVED: To stabilize the working state in each part of a heating apparatus provided with a substrate made of a ceramic and a heat radiating body buried in the substrate and comprising a heating face formed in the substrate for treating a material to be heated. SOLUTION: This heating apparatus comprises a resistance control part 2c, for example, of a layered type, formed in a substrate 2 and made of a ceramic having a higher volumetric resistivity than that of a prescribed ceramic. Preferably, a conductive functional part 3 is buried between the resistance control layer 2c and a heating face 5 and the conductive functional part 3 is an electrostatic chuck electrode or an electrode for generating high frequency and the prescribed ceramic is an aluminum nitride type ceramic and the ceramic used for the resistance control part 2c mainly contains alumina, silicon nitride, boron nitride, silicon oxide, or yttrium oxide. |
