| 摘要 |
PROBLEM TO BE SOLVED: To obtain a positive photosensitive composition to be used as an exposure light source with a specified wavelength region by using a resin having specified alicyclic groups and a specified additive. SOLUTION: This positive photosensitive composition comprises a compound to generate an acid by irradiation with activated rays or radiation, a resin having at least one of polycyclic and alicyclic univalent compounds represented by formulae I-III, and groups to be decomposed by an acid and to be increased in solubility in an alkaline developing solution, a low-molecular compound having a hydrophilic functional group and a 5-30 cross-linkable hydrocarbon group or a 10-30C naphthalene compound having a hydrophilic functional group, and in which each of R1 -R5 , R7 and R9 is, independently, an optionally substituted alkyl or cycloalkyl or alkenyl group or the like, thus permitting the obtained composition to be adapted to an exposure light in the wavelength region of 170-220 nm. |
