| 摘要 |
<p>A process apparatus is provided to prevent a chamber from being corroded by plasma or cleaning gas by forming a spray layer on the inner wall of the chamber wherein the spray layer is composed of Al2O3 and Y2O3 in the Al2O3/Y2O3 ratio of 0.5 or higher. A processed article is received in a process receptacle. A process unit performs a plasma treatment on the processed article in the process receptacle. A layer is formed on the surface of a base material exposed to plasma in the process receptacle by a spray method, including an element compound belonging to a 3a-group of the periodic table wherein the element compound has anti-corrosion so that the reduction quantity by the plasma is smaller than the reduction quantity of an alumina member. The layer including the element compound belonging to the 3a-group of the periodic table can be substantially made of a Y2O3 layer.</p> |
