| 发明名称 |
Integrated circuit fabrication |
| 摘要 |
The quartz shadow ring of a conventional plasma etching apparatus is desirably coated with material which inhibits the liberation of oxygen into the plasma. Investigation has shown that the liberated oxygen degrades etching uniformity across the wafer.
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| 申请公布号 |
US5955381(A) |
申请公布日期 |
1999.09.21 |
| 申请号 |
US19980034079 |
申请日期 |
1998.03.03 |
| 申请人 |
LUCENT TECHNOLOGIES INC. |
发明人 |
BITTING, DONALD STEPHEN;ESRY, THOMAS CRAIG;HUIBREGTSE, DAVID;WHEELER, PAUL EDWARD |
| 分类号 |
H01L21/302;H01L21/00;H01L21/306;H01L21/3065;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/302 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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