| 摘要 |
<p>An ultraviolet laser apparatus is characterized in that the apparatus comprises a laser beam generator having a single-wavelength oscillation laser for generating a laser beam of a single wavelength in a wavelength range of from the infrared region to the visible region, an optical amplifier having a fiber optical amplifier for amplifying the laser beam generated by the laser beam generator, and a wavelength converter for converting the wavelength of the amplified laser beam into an ultraviolet beam using a nonlinear optical crystal, and in that the apparatus produces ultraviolet beam of a single wavelength. An exposure apparatus for transferring the pattern of a mask onto a substrate is characterized by comprising a light source including a laser emitting a laser beam of a single wavelength, a first fiber optical amplifier for amplifying the laser beam, a beam-branching unit for branching the amplified laser beam into a plurality of beams, and a second fiber optical amplifier for amplifying the branched beams; and an optical transmission system for transmitting the laser beam emitted from the light source to the exposure apparatus.</p> |
