Vacuum processing apparatus

摘要

A vacuum processing apparatus includes a process chamber capable of being evacuated and a gas quantity detector for outputting a gas quantity signal corresponding to a partial pressure of each kind of gas contained in the process chamber. The gas quantity detector has a detection sensitivity set in response to a sensitivity calibration signal externally supplied and generates the gas quantity signal at the set detection sensitivity. A controller receives the gas quantity signal output from the gas quantity detector and outputs the sensitivity calibration signal to the gas quantity detector so that a magnitude of the gas quantity signal for one reference gas selected from gasses contained in the process gas becomes near a target value. Vacuum processing techniques are provided for stably detecting the content of impurity gas by calibrating the sensitivity of the gas quantity detector.