发明名称 |
Method of patterning a metal substrate using spin-on glass as a hard mask |
摘要 |
A method for patterning an underlying metal substrate includes forming a layer of spin-on glass over the metal substrate, forming a layer of photoresist over the spin-on glass, patterning the photoresist, patterning the spin-on glass using the photoresist as a mask, and patterning the metal substrate by applying an etch using the spin-on glass as a hard mask wherein the etch removes the photoresist and partially removes the spin-on glass. In one embodiment, the spin-on glass is patterned by applying a fluorine-based plasma, an aluminum-based metal substrate is patterned by applying a chlorine-based plasma in which an etch selectivity of the metal substrate to the spin-on glass is at least 10:1, and the spin-on glass is removed by applying another fluorine-based plasma.
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申请公布号 |
US5950106(A) |
申请公布日期 |
1999.09.07 |
申请号 |
US19960647510 |
申请日期 |
1996.05.14 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
MAY, CHARLES E.;DAWSON, ROBERT |
分类号 |
G03F7/09;H01L21/033;H01L21/3213;(IPC1-7):H01L21/44 |
主分类号 |
G03F7/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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