发明名称 LOW PRESSURE INDUCTIVELY COUPLED HIGH DENSITY PLASMA REACTOR
摘要 <p>A plasma reactor comprises an electromagnetic energy source coupled to a radiator through first and second variable impedance networks. The plasma reactor includes a chamber having a dielectric window that is proximate to the radiator. A shield is positioned between the radiator and the dielectric window. The shield substantially covers a surface of the radiator near the dielectric window. A portion of the radiator that is not covered by the shield is proximate to a conductive wall of the chamber. Plasma reactor operation includes the following steps: a plasma is ignited in a chamber with substantially capacitive electric energy coupled from the radiator; a variable impedance network is tuned so that the capacitive electric energy coupled into the chamber is diminished; the plasma is then powered with substantially magnetic energy.</p>
申请公布号 WO1999044219(A1) 申请公布日期 1999.09.02
申请号 US1999004325 申请日期 1999.02.26
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