FORMING METHOD FOR POLYSILICON LAYER OF SEMICONDUCTOR DEVICE,申请号KR19960022784-传众专利搜索

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发明名称	FORMING METHOD FOR POLYSILICON LAYER OF SEMICONDUCTOR DEVICE
摘要
申请公布号	KR100217913(B1)	申请公布日期	1999.09.01
申请号	KR19960022784	申请日期	1996.06.21
申请人	HYUNDAI ELECTRONICS IND. CO.,LTD	发明人	KIM, JIN TAE;PARK, DONG SOO
分类号	H01L21/285;(IPC1-7):H01L21/285	主分类号	H01L21/285
代理机构		代理人
主权项
地址

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