发明名称 |
Wet station apparatus having quartz heater monitoring system and method of monitoring thereof |
摘要 |
A wet station apparatus used for cleaning and wet etching a semiconductor wafer includes a chemical container for holding a chemical solution, a temperature measuring device for measuring a temperature of the chemical solution, a temperature control unit for comparing the temperature measured by the temperature measuring device with a predetermined reference temperature value, and outputting the result as a control signal, a quartz heater for heating the chemical solution, a power supply controller for receiving the control signal and adjusting the power supplied to the quartz heater, and a power switch connected to the power supply controller, for receiving a heating initiation signal and switching power to the quartz heater, wherein a heater monitoring system is further provided for monitoring the operating states of the quartz heater and the power supply controller and notifying an operator of any problems.
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申请公布号 |
US5944939(A) |
申请公布日期 |
1999.08.31 |
申请号 |
US19960735454 |
申请日期 |
1996.10.23 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JUNG, JAE-HYUNG;YUN, YOUNG-HWAN;KO, SE-JONG;YUN, MIN-SANG |
分类号 |
H01L21/306;H01L21/00;H01L21/304;(IPC1-7):C23F1/02 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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