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发明名称
ELECTRON BEAM LITHOGRAPHY EQUIPMENT
摘要
申请公布号
JPH11238671(A)
申请公布日期
1999.08.31
申请号
JP19980038977
申请日期
1998.02.20
申请人
TOSHIBA CORP;TOSHIBA MACH CO LTD
发明人
KAMIKUBO TAKASHI;ABE TAKAYUKI;YASUSE HIROTO;FUKUTOME YUJI;SHIMIZU MITSUKO;OKI SUSUMU;HATTORI YOSHIAKI;IIJIMA TOMOHIRO
分类号
G03F7/20;H01J37/305;H01L21/027;(IPC1-7):H01L21/027
主分类号
G03F7/20
代理机构
代理人
主权项
地址
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