发明名称 BISMUTH-SUBSTITUTED GARNET THICK FILM MATERIAL AND ITS PRODUCTION
摘要 PROBLEM TO BE SOLVED: To provide the subject garnet thick film material that is used as a substitute material for a Tb-Bi based garnet thick film material having essential absorption in an about >=1.6 μm wavelength band region and has improved insertion loss (improved transmissivity) and an improved θf/ T (temp. coefficient of Faraday rotation angle (θf ) value in a >=1.5 μm wavelength band region in which an unfavorable influence on the absorption spectrum due to Th ions is caused, and also to provide the production of this material. SOLUTION: This film material is a bismuth-substituted garnet thick film material which is produced by an LPE(liquid phase epitaxy) method with NGG (neodymium gallium garnet, Nd3 Ga5 O12 ) as the substrate and has a composition represented by the chemical formula Gd3-x-y-2 Yx Yby Biz Fe5-a Ala O12 (wherein: each of (x) and (y) is a numerical value of 0 to 0.2 and when any one of (x) and (y) is 0, the other is not 0; (z) is a numerical value of 0.8 to 1.4; and (a) is a numerical value of 0.2 to 0.7) and also contains 0 to 3.7 wt.% B2 O3 . The material is subjected to heat treatment while maintaining the material at 950 to 1,130 deg.C in an atmosphere having a >=5% oxygen concn.
申请公布号 JPH11236296(A) 申请公布日期 1999.08.31
申请号 JP19980055830 申请日期 1998.02.20
申请人 TOKIN CORP 发明人 SATO TADAKUNI
分类号 G02F1/09;C30B29/28;H01F1/34;H01F10/24 主分类号 G02F1/09
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