发明名称 Methods of electroplating solder bumps of uniform height on integrated circuit substrates
摘要 A method of electroplating solder bumps on an integrated circuit substrate containing a plurality of active semiconductor devices in the substrate and a plurality of contact pads electrically connected to the active semiconductor devices, comprising the steps of: forming a plating base layer which electrically shorts the plurality of contact pads together, on the substrate; and electroplating solder bumps on the plating base layer by drawing plating current vertically through the substrate via a first plurality of parallel electrical paths formed by the plating base layer and the plurality of active semiconductor devices.
申请公布号 EP0877419(A3) 申请公布日期 1999.08.18
申请号 EP19980303275 申请日期 1998.04.28
申请人 MCNC 发明人 RINNE, GLENN A.;LIZZUL, CHRISTINE
分类号 C25D7/12;H01L21/60;H01L23/12 主分类号 C25D7/12
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