| 摘要 |
PROBLEM TO BE SOLVED: To form a high-reflectivity reflective layer and a transparent resistance layer on a substrate with good reliability and evenly by a method, wherein the atmospheric pressure in the interiors of active oxygen treating chambers is reduced, oxygen gas is interdicted in the treating chambers to adjust the pressure in the interiors of the treating chamber to a prescribed pressure, and subsequently, after the temperature in the interiors of the treating chambers is heated higher than a prescribed temperature, the temperature in the interiors of the treating chambers is cooled. SOLUTION: The interior of each chamber of a reflective layer film-forming chamber 205, active oxygen treating chambers 206 and 207 and transparent resistance layer film-forming chambers 208 and 209 is vacuum-exhausted by vacuum pumps 239 and 240. After the interior of each chamber has been vacuum-exhausted to a prescribed pressure, the opening of an exhaust value is adjusted and the pressure in the interior of each chamber is adjusted to the prescribed pressure. A plurality of infrared lamps of heater units 237 and 238 provided in the chambers 206 and 207 are lighted up, and the inner wall of a prescribed, partition plates 227 and 228 and the like are heated. For controlling the temperature in the interiors of the chambers 206 and 207, a temperature sensor is kept provided in the vicinity of a substrate 204, and the temperature in the interiors of the chambers 206 and 207 is controlled higher than a prescribed temperature. After the interiors of the chambers 206 and 207 have been heated for a prescribed time, the interiors are forcibly cooled or are left to stand to cool, a winding roll 211 is rotated by a servo motor to carry the continuous substrate 204 at a constant speed and after that, the film formation of a reflective layer an a resistance layer on the substrate 204 is started. |
