发明名称 PRODUCTION OF REFLECTION TYPE OPTICAL DIFFRACTION ELEMENT FOR GAUSSIAN LIGHT FLUX
摘要 PROBLEM TO BE SOLVED: To extremely speedily find mask conditions without working through trial and error and being strongly affected by errors by finding the mask conditions based on an approximate value provided by the Taylor's expansion of a general equality expressing an optical path difference function satisfying prescribed optical characteristics. SOLUTION: The image of a beam waist (ω1 ) existent on coordinates (X1 , (Y1 , Z1 ) of an incident side medium having a refractive index (n) is formed into beam waist (ω2 ) existent on coordinates (X2 , Y2 , Z2 ) of the incident side medium, and an optical path difference functionρ(x, y) satisfying the optical characteristics showing a focal distance (f) is found as the general equality ofρ(x,y)=(1/2).(x<2> +y<2> +f<2> )<1/2> -(f/2)+(n+2).(X1 x+Y1 y)/(X1 <2> +Y1 <2> +Z1 <2> )<1/2> -(n/2).(X2 x+Y2 y)/(X2 <2> +Y2 <2> +Z2 <2> )<1/2> . The approximate value is found by the Taylor's expansion of the found optical path difference function, and the mask conditions are found by inputting the coefficients of respective terms in this approximate value to a computer program.
申请公布号 JPH11223715(A) 申请公布日期 1999.08.17
申请号 JP19980038102 申请日期 1998.02.04
申请人 OKI ELECTRIC IND CO LTD;REAL WORLD COMPUTING PARTNERSHIP 发明人 SASAKI HIRONORI
分类号 G02B5/08;G02B5/18;G02B5/32;(IPC1-7):G02B5/18 主分类号 G02B5/08
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