TANTALUM AND NIOBIUM REAGENTS USEFUL IN CHEMICAL VAPOR DEPOSITION PROCESSES, AND PROCESS FOR DEPOSITING COATINGS USING THE SAME,申请号EP19950932505-传众专利搜索

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发明名称	TANTALUM AND NIOBIUM REAGENTS USEFUL IN CHEMICAL VAPOR DEPOSITION PROCESSES, AND PROCESS FOR DEPOSITING COATINGS USING THE SAME
摘要
申请公布号	EP0792383(A4)	申请公布日期	1999.08.11
申请号	EP19950932505	申请日期	1995.09.14
申请人	ADVANCED TECHNOLOGY MATERIALS, INC.	发明人	KIRLIN, PETER S.;VAARTSTRA, BRIAN A.;GORDON, DOUGLAS;GLASSMAN, TIMOTHY E.
分类号	C07F9/00;C23C16/18;C23C16/40;(IPC1-7):C23C16/00	主分类号	C07F9/00
代理机构		代理人
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